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High vacuum chamber for thin film deposition

The high vacuum chamber was designed and built for thin film deposition by laser ablation, necessary for the growth of nanostructures, as well as for the further development of other applications.
Construction:
Stainless steel 1.4541
Main components:
– Inspection door – Dn400 (1 pc)
– Flange section Dn16..40 KF (13 pcs)
– Flange section Dn63..200 ISO (13 pcs)
– Viewer Dn63…160 (8 pcs)
– Adjustable window mount and laser lens (3 pcs)
– Adjustable furnace for thin film deposition on silicon (1 pc)
– XYZ mobile arm driven by stepper motors (1 pc)
– Inner support (made of duralumin, 1 pc)
– Adjustable shutter (1 pc)

Handling system

Handling system for the electronic modules of the Hadronic Calorimeter, part of the ATLAS detector at the LHC CERN Geneva – The system is used to extract the electronic “super-drawers” from the calorimeter modules and reinsert them “in situ.”

In recognition of the qualities of the developed system, INCDTIM produced two new handling devices in 2012, incorporating several new solutions due to changes in the ATLAS detector infrastructure.

Components for high and preliminary vacuum lines

KF, ISO, and CF type sections, flanges, and fittings, flanges with vacuum electrical feedthroughs, liquid nitrogen or water traps, etc., intended for the construction of research equipment and industrial applications.
Field of application:
Types of sections, flanges, and fittings:
– DN 10,16,25,40,50 KF
– DN 63,100,160,200,250,320,400,500,630 ISO
– DN 16,40(35),63,100,160,200,250 CF
Construction:
Materials: Stainless steel 1.4306 (1.4541, 1.4571), Duraluminum

High vacuum chamber

The high vacuum chamber for thin film deposition was designed and built for the study of quantum interface effects in metal/ C60 nanostructures.

Construction:
Stainless steel 1.4541
Main components:
– Sample introduction lock equipped with manipulator (1 pc)
– Target adjustment system (1 pc)
– Electron source with cooling system (1 pc)
– Adjustable furnace support (1 pc)
– Adjustable shutter (1 pc)
– Section with Dn25 KF flange (3 pcs)
– Section with Dn100..200 ISO flange (5 pcs)
– Dn1000 sight glass (2 pcs)

High vacuum chamber

The high vacuum chamber was designed and built for the research and development of new materials and technologies and the creation of micro- and nanostructures.

Construction:
Stainless steel 1.4541
Main components:
-Section with Dn63 ISO flange (2 pcs)
-Section with Dn100 KF flange (4 pcs)
-Dn100 ISO flange with 4 inclined current passages (1 pc)
-Dn100 ISO flange with 4 BNC-IT passages (1 pc)
-Dn63 ISO sight glass (1 pc)
-Adjustable sample holder (1 pc)

Installation for dynamic processing of substances in a microwave field

The application refers to a process and installation for dynamic processing of substances in a pulsed microwave field with a wide spectrum of microwave frequencies. This processing mode facilitates, in addition to the thermal effect due to dielectric and magnetic losses, the selective absorption of microwaves at the molecular vibration and translation energy level in the processed substances, thus reducing treatment time, improving processing yields, and expanding chemical processing possibilities.

Features:
– incident microwave power, adjustable in the range of 100W-900W, at a frequency of 2.45 GHz
– fine adjustable microwave energy during activation time (programmable activation duration in pulses or continuous mode);
– Activation with power pulses with a repetition frequency of 1Hz, with controllable pulse width in the range of 100ms-1s
– Independent operation based on RISC microcontroller with parameter display on LCD screen
– Power supply 220V/50Hz, max. 1200VA
– Digestion cells adaptable to the application (6ml – 100ml)
Field of use:
PATENT RO 00122063 – Gold medal at the 35th International Exhibition of Inventions, Techniques and New Products, April 18–22, 2007, Geneva, Switzerland; Gold medal at the 11th edition of the International Exhibition of Inventions and New Technologies – INVENTIKA October 2–6, 2007, Bucharest, Romania

Robotic system for generating three-dimensional surfaces for laser cleaning techniques

The aim of the EUREKA project, LARLASC – “Large Area Laser Surface Cleaning” was to develop and implement a new surface cleaning process using unconventional, high-productivity technologies. A mobile surface processing unit was built, capable of cleaning very large surfaces, with a productivity of tens of square meters per hour. At INCDTIM, a tracking system was developed for complex three-dimensional surfaces carrying the working laser module.

Direct resistive heating furnace

Features:
Coupling flange …………..Dn 63 ISO(CF)
Electrical power ……… 1,7 Kw
Tmax. ……………………. 2.000 K
Cooling water flow… max.16,67 cm3/sec
Field of use:
The direct resistive heating furnace is designed to operate in a vacuum chamber. It ensures the possibility of obtaining high temperatures without using high voltage power sources. Thanks to the technical solutions adopted in its design and construction, the furnace has high stability and very low thermal inertia and allows for the controlled introduction of gases into the furnace. These characteristics make it suitable for a wide range of applications, among which its use as a source of nanoparticles through adiabatic expansion stands out.
Construction:
Materials: Stainless steel 1.4306 (1.4541), Ta, ceramic, copper, duralumin, rubber (for sealing)

Silicon furnace

The furnace is designed to operate in a vacuum chamber. It can reach temperatures of 1,100 K. The ceramic furnace support allows the sample to be fixed to the silicon resistance, the furnace to be rotated, and the sample (target) to be moved for centering.

Features:
Materials: silicon, ceramic, stainless steel, duralumin
Movement: x,y = +12,5mm, z = + 12,5mm
Rotation: -50, +950
Temperature: 1100 K

Gold deposition furnace

The furnace is designed to operate in a vacuum chamber. It allows high temperatures to be reached – 1,300 K – without the use of high-voltage power sources and allows the position of the furnace to be adjusted within the vacuum chamber.

Construction:

Coupling flange: Dn63ISO ( Dn 63CF)
Materials: molybdenum, ceramic, stainless steel, Teflon
The furnace consists of the following parts:
1. The furnace itself is constructed of two ceramic flanges, in which the ceramic supports are fixed, on which the Mo resistance is wound. The ends of the resistance exit the housing through two ceramic tubes. The furnace has a stainless steel screen between the ceramic flanges. The gold is placed inside the furnace in a ceramic nacelle.
2. Furnace support. This is a flange fixed to the furnace casing, which ensures the centering, shielding, and adjustment of the furnace position in the vacuum chamber and the insulation of the supply lines.
3. Dn 63 flange. It supports the entire furnace, ensures easy assembly and disassembly of its components, and connects the furnace to the vacuum chamber. Given that the experiments require repeated assembly and disassembly, sealing against the vacuum chamber is ensured by a rubber gasket. The flange is made of stainless steel and is equipped with a passage for the electrical power supply contact of the resistance and with fins for the tie rods on which the furnace support is fixed and adjusted.
4. Power supply passage. It consists of a press-fit sealing system with Teflon gaskets, which is welded to the flange (3).

Laser focusing system

Field of use:
The laser focusing system with three degrees of freedom was designed and manufactured to enable the adjustment of the laser beam in vacuum chambers, as close as possible to the target (sample).
Construction:
Stainless steel 1.4541
Main components:
-Coupling flange on Dn63 ISO chamber (1 pc)
-Lens adjustment system for different lens-target distances (1 pc)
-Window mount -for different window-target distances (1 pc)
-Adjustable lens mount (1 pc):
-coarse adjustment X-axis: 70mm
-fine adjustment X-axis: ±12.5mm
-rotation on Y and Z axes: ±100

Wien filter

The Wien filter is designed to operate in an advanced vacuum chamber and allows the selection of nanoparticles according to their size by applying two fields, electric and magnetic, perpendicular to each other and perpendicular to the axis of movement of the ionized nanoparticles.

Construction:
The system is mounted on a Dn63 ISO(CF) flange and is equipped with two electrostatic lenses mounted on a parallelepiped-shaped duralumin body, electrostatic deflection plates, NdFeB magnets (Bs = 1.1 Tesla), a collector electrode, ceramic insulators, and metal-glass transitions.

Experimental cryogenic isotope separation facility

Experimental studies for the separation of  13C and 18O isotopes by cryogenic distillation.

The experimental installation for the separation of  13C by cryogenic distillation of carbon monoxide, designed and built entirely at INCDTIM, allows the mounting of columns with diameters of up to 35 mm. It is served by a liquid nitrogen production plant, the cooling agent used in this process. Carbon monoxide is purified by distillation at a temperature of -193°C, in a specially built plant and is continuously analyzed using a gas chromatograph.

Experimental plant for the separation of 13C by CO2-carbamate chemical exchange

The experimental plant for the separation of 13C by CO2-carbamate chemical exchange was designed and built entirely at INCDTIM. Its operation is monitored by sensors measuring the main parameters, and the data is stored on a PC. The chemical exchange separation method is an alternative to cryogenic separation of 13C, but the two can be used in tandem.

15N separation plant Nitrox system, 99% 15N concentration……

The technological research and production facility for 15N through isotopic exchange between nitric acid and nitrogen oxides, designed and built entirely at INCDTIM, is capable of producing nitric acid with an isotopic concentration of over 99% at. 15N. The product has enabled the development of highly efficient isotopic technologies for labeling substances with 15N..

Flow regulator for filtered non-corrosive gases

Features:
Ambient temperature: -10°C … +55°C
Pressure range: 1 – 3 bar
Flow range: 5 – 10 ml / min
Adjustment error: 3% (at a pressure variation of 0.5 bar) Field of use:
The regulator is designed for fine adjustment and maintenance of constant flow rates in gas circuits. Construction:
Body: brass (CuZn39Pb2)
Diaphragm: NBR rubber
Seals: Teflon P600
Connection: M8 (other sizes optional)

Dn3(4) pressure regulator for filtered gases

The regulator is designed for fine adjustment and maintenance of constant pressure in gas circuits.

Features:
Ambient temperature: -10°C … +55°C
Gas temperature: +5°C…+80°C
Maximum permissible pressure: 5(8) bar
Adjustment range: 0.5…4.5(7.5) bar
Maximum flow rate: 900(4000) ml/h
Nominal diameter: 3(4)mm

Construction:
Body: stainless steel 1.4571 or brass
Diaphragm: stainless steel or brass
Valve: PTFE
Connection: M8 (M10)

Dn2 shut-off valve for filtered gases and liquids

The valve is designed to shut off and open gas or liquid circuits.

Features:
Ambient temperature: -10°C … +55°C
Fluid temperature: +5°C…+80°C
Maximum permissible pressure: 200 bar
Maximum flow rate: 15 l/min

Construction:
Body: stainless steel 1.4571 or brass
Shut-off disc: Kelef
Seal: PTFE
Connection: M14x1.5 (and sealing with spherical connection)

Dn6 control valve for filtered gases

The valve is designed to regulate the flow in gas and liquid circuits.

Features:
Ambient temperature: -10°C … +55°C
Fluid temperature: +5°C…+80°C
Maximum permissible pressure: 20 bar

Construction:
Body: stainless steel 1.4571 or brass
Stem: high alloy steel 90Cr180
Seat: PTFE
Connection: M16x1.5 and sealing with stainless steel ball connection or SW

Electromagnetically operated switching valve for gases

Features:
Ambient temperature: -10°C … +55°C
Gas temperature: +5°C…+100°C
Maximum permissible pressure: 4.5 bar
Gas passage sections: 0.5 mm
Supply voltage: 48 Vdc
Field of application:
The valve is designed for switching gas circuits.
In chromatography, it is used both as a sample introduction valve and as a switching valve for separation columns.
Construction:
Body: high-alloy steel: W4112
Drawer: PTFE
Connection: M8 (sealed with spherical connection)
Connection of channels: -actuated 1-2, 3-4, 5-6, 7-8
-non-actuated 2-3, 4-8, 6-7

Pneumatically operated switching valve for gases

Features:
Ambient temperature: -10°C … +55°C
Gas temperature: +5°C…+100°C
Maximum permissible pressure: 4.5 bar
Gas passage cross-section: 0.5 mm
Compressed air pressure: 4 bar
Application:
The valve is designed for switching gas circuits.
In chromatography, it is used both as a sample introduction valve and as a switching valve for separation columns.
Construction:
Body: high-alloy steel: W4112
Spool: PTFE
Connection: M8 (sealed with ball joint)
Connection of channels: -actuated 1-2, 3-4, 5-6, 7-8
-non-actuated 2-3, 4-8, 6-7

Electromagnetic switching valve type RC1E or electric motor type RC2E for filtered gases

The valve is designed for switching pneumatic circuits in automated equipment.

Features:
Ambient temperature: -10°C … +55°C
Gas temperature: +20°C…+80°C
Maximum permissible pressure: 4.5 bar
Gas passage sections: 0.5 mm
Supply voltage: 48 Vdc
Number of channels: 12/6
Drawer rotation angle: 60°

Construction:
Body: stainless steel: W4571
Drawer: Teflon P600
Connection: M8 (sealed with spherical connection)
Pole connection:
-activated 1-2, 3-4, 5-6, 7-8, 9-10, 11-12
-deactivated 1-6, 2-3, 4-5, 7-12, 8-9, 10-11

SI100 type sample introduction valve for liquids

Features:
Ambient temperature: +5°C … +55°C
Liquid temperature: +20°C…+80°C
Maximum permissible pressure: 450 bar
Sample loss during injection: 2-5 volumes equivalent to the sample loop volume
Sample loop volume range: 5.ul – 2.5ml
Liquid passage sections:.. 0.5 mm
Actuation torque: max…….. 15daNcm
Drawer rotation angle:…. 60°
Field of use:
The valve is designed to switch high-pressure liquid circuits, with 6 ports with external sample loop. Construction:
Materials in contact with the sample: stainless steel W4571, PTFE, ceramic
Connection: M8 (sealed with connection)

SI200 sample introduction valve for liquids

Features:
Ambient temperature: +5°C … +55°C
Liquid temperature:…………… +20°C…+80°C
Maximum permissible pressure:. 450 bar
Sample loss during injection:……. 0
Sample loop volume range: 5.0 – 5ml
Liquid passage sections: 0.5 mm
Actuation torque: max…… 15daNcm
Drawer rotation angle:.. 60°
Injection syringe: Lauer type (d=0.7mm, l=55mm)
Field of use:
The valve is designed to switch high-pressure fluid circuits and has 6 ports with an internal injection port. Construction:
Materials in contact with the sample: W4571 stainless steel, Teflon
P600, ceramic
Connection: M8 (sealed with spherical connection)

Control valve -RR1 for filtered gases

Features:
Ambient temperature: -10°C … +55°C
Fluid temperature: +5°C…+80°C
Maximum permissible pressure: 5 bar
Maximum flow rate: 100 ml/min
Application:
The valve is designed for fine adjustment of gas flow in circuits used for analysis processes.
Construction:
Body: stainless steel W4571 or brass CuZn39Pb2
Seals: Teflon P600
Connection: M8 (other sizes optional)

High vacuum valve for gases

Features:
Min. gas flow rate: 10-8 mbar l/s
Max. gas flow rate for Pi=1 bar: 600 mbar l/s
Max. degassing temperature:
– 4500C for valve with CF flanges
– 800C for valve with KF flanges
Maximum permissible pressure: 1 bar
Application:
The valve is designed for the controlled introduction of gases into high vacuum systems. Fine adjustment is achieved by turning the micrometric screw.
Construction:
Body: stainless steel: W4571
Drawer: ceramic (Duralumin)
Separation membrane: 1.4571
Connection:
-on the high vacuum line Dn35CF(40KF)
-on the introduction line Dn16CF(16KF)

Tap introduced for filtered gas samples

Features:
Ambient temperature: -10°C … +55°C
Gas temperature: +5°C…+100°C
Maximum permissible pressure: 6 bar
Gas passage sections: 2 mm
Drawer rotation angle: 60°
Number of ports: 6
Area of application:
The valve is designed for switching gas circuits.
In chromatography, it is also used for introducing the sample volume.
Construction:
Materials in contact with the sample: stainless steel 1.4571 or brass, PTFE
Connection: M8 (sealed with ball joint)

Dn2 fine adjustment valve for gases and liquids

The valve is designed for fine adjustment of the flow rate in gas and liquid circuits.
Features:
Ambient temperature: -10°C … +55°C
Fluid temperature: +5°C…+80°C
Maximum permissible pressure: 200 bar
Maximum flow rate: 15 l / min
Field of application:
The valve is designed for flow control in gas and liquid circuits.
Construction:
Body: stainless steel 1.4571 or brass
Stem: high-alloy steel 90Cr180
Seat: PTFE
Connection: M14x1.5 (and sealing with stainless steel or brass ball connection)

Restrictor valve for filtered gases

Features:
Ambient temperature: -10°C … +55°C
Fluid temperature: +5°C …+80°C
Maximum permissible pressure: 4.5 bar
Maximum flow rate: 150 ml / min
Field of application:
The valve is designed for fine adjustment of the gas flow in circuits intended for analysis processes.
Construction:
Body: stainless steel 1.4571 or brass
Seat: PTFE
Seals: PF60A rubber
Connection: M14x1.5 (sealed with spherical connection)

RSC100 type circuit selection valve for gases and liquids

Features:
Ambient temperature: +5°C … +55°C
Liquid temperature: +20°C…+80°C
Maximum permissible pressure: 25 bar
Flow range: 10… 200ml
Number of selectable flows: 8
Supply voltage: 220V
Application:
The valve is driven by a stepper motor and is designed to select gas or liquid flows.
Flow selection is programmed on a computer.
Construction:
Materials in contact with the sample: stainless steel 1.4571, PTFE.
Connection: M8 (sealed with spherical connection)

DN6 electropneumatic distributor for filtered, lubricated air or neutral gas, 5-way/2-position

The 5-way/2-position electropneumatic distributor for filtered, lubricated air or neutral gas is used in automated pneumatic lines.
Features:
Ambient temperature: -10°C … +55°C
Fluid temperature: 0°C…+80°C
Maximum permissible pressure: 6 bar
Minimum number of connections: 400,000
Maximum connection frequency: 30/min
Field of application:
The 5-way, 2-position electro-pneumatic distributor for filtered, lubricated air or neutral gas is used in automated pneumatic lines.
Construction:
Body: duralumin (or brass)
Sealing gaskets: NBR rubber, P600 Teflon
Protection rating: IP54
Climate protection: THA3
Connection: G1/4 (other sizes optional)

Electromagnetic valve Dn1.5…4 for filtered non-corrosive gases and liquids 2-way/2-position or 3-way/2-position

The 2-way/2-position electromagnetic valve is designed for the automation of pneumatic and/or hydraulic circuits in scientific equipment and industrial applications.
Features:
Ambient temperature: -10°C … +55°C
Fluid temperature:…………………..0°C…+80°C
Maximum permissible pressure:…….40 bar
Maximum permissible viscosity:… 40 centistokes
Minimum number of connections:………400000
Maximum connection frequency:. 40/min
Field of use:
The 2-way/2-position or 3-way/2-position indirect-acting solenoid valve is designed for the automation of pneumatic and/or hydraulic circuits in scientific equipment and industrial applications.
Construction:
Body: brass (or stainless steel)
Sealing gaskets: NBR rubber
Degree of protection: IP54
Climate protection: THA3
Connection: G1/4 (other sizes optional)
Power supply signaling: SD (optional)
Power cable: l=0.5m (standard)

Dn14 electromagnetic valve for filtered non-corrosive gases and liquids 2-way/2-position

Features:
Ambient temperature: -10°C … +55°C
Fluid temperature:…………………. 0°C…+80°C
Maximum permissible pressure:…. 20 bar
Pressure difference:……………… 0.1 to 15 bar
Maximum permissible viscosity: 40 centistokes
Minimum number of connections:…… .400,000
Maximum connection frequency: 40/minExample of electromagnetic valve notation:
VE2/2 – Dn14/ G1/2 / 24Vdc / SD / l=1.5m
Field of application:
The 2-way, 2-position, indirectly operated solenoid valve is designed for the automation of pneumatic and/or hydraulic circuits in scientific equipment and for industrial applications.
Construction:
Body: duralumin
Sealing gaskets: NBR rubber
Protection rating: IP54
Climate protection: THA3
Connection: G1/2 (other sizes optional)
Power supply signal: SD (optional)
Power cable: l=0.5m (standard)

SLS100 solvent delivery system for liquid chromatography

Features:
Ambient temperature: +10°C … +40°C
Pump flow rate: 100 ml/stroke
Delivery flow range: 0.1…10 ml/min
Flow programming: incremental increase of 0.1 ml/min
Working pressure range: 0…400 bar
Pressure stability: <2.5% amplitude for pressure >10 bar
Supply voltage: 220V
Range of use:
The SLS100 solvent delivery system is designed for high-performance liquid chromatographs (HPLC), supplying the HPLC system with solvent under strict pressure and flow conditions.
The SLS100 can be used as a stand-alone unit in various applications requiring fine liquid dosing.
The SLS100 consists of a hydraulic module (which mainly has a constant flow suction-repulsion pump with two pistons offset by 180°, a flow pulsation damping unit) and an electronic module.
Construction:
Materials in contact with the sample: stainless steel 1.4571, PTFE, kel-F, sapphire, ruby.

XZ manipulator

The XZ mobile arm, driven by stepper motors, was designed for positioning the sample (target) in vacuum chambers.
Features:
Coupling flange: Dn160-ISO
x = +15mm
z = +35mm